We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz–200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than ≈10 kHz.
Plume shielding effects in ultrafast laser surface texturing of silicon at high repetition rate in air
Valadan M.;
2019-01-01
Abstract
We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz–200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than ≈10 kHz.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
